符毓 Yu (2023-04-30 17:23):
#paper doi: 10.1126/science.272.5258.85 Science, 1996, Imprint Lithography with 25-Nanometer Resolution。Stephen Chou(周郁)首次提出纳米压印方式用半导体集成电路生产上,并成功做出25nm的精度。纳米压印比起光刻具有低成本,高通量的优势。 相关行业最新进展:近年来佳能已将纳米压印应用到了 15nm 的 NAND 闪存制造上,并宣称2025年有望用此技术量产5nm芯片
IF:44.700Q1 Science, 2006. DOI: 10.1126/science.272.5258.85
Imprint Lithography with 25-Nanometer Resolution
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Abstract:
A high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated. The technique uses compression molding to create a thickness contrast pattern in a thin resist film carried on a substrate, followed by anisotropic etching to transfer the pattern through the entire resist thickness. Metal patterns with a feature size of 25 nanometers and a period of 70 nanometers were fabricated with the use of resist templates created by imprint lithography in combination with a lift-off process. With further development, imprint lithography should allow fabrication of sub-10-nanometer structures and may become a commercially viable technique for manufacturing integrated circuits and other nanodevices.
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